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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
UV LED Nail Lamp. Featuring a near-perfect rating on Amazon and over 49,000 customer reviews, this best-selling nail lamp uses a built-in sensor and adjustable timer to cut down on drying time.
Typical F71T12 71-inch, 100-watt, bi-pin tanning lamp. Ultraviolet radiation (UVR) is part of the electromagnetic spectrum, just beyond visible light.Ultraviolet wavelengths are 100 to 400 nanometres (nm, billionths of a metre) and are divided into three bands: A, B and C. UVA wavelengths are the longest, 315 to 400 nm; UVB are 280 to 315 nm, and UVC wavelengths are the shortest, 100 to 280 nm.
Tanning lamps are virtually maintenance free, but must be kept clean, as UV can easily be blocked by dust drawn in from the cooling system (or from improperly cleaned acrylics shields). Most manufacturers recommend wiping the lamps and other internals clean every 200 to 300 hours of operation.
Excimer lamps are quasimonochromatic light sources operating over a wide range of wavelengths in the ultraviolet (UV) and vacuum ultraviolet (VUV) spectral regions. Operation of an excimer lamp is based on the formation of excited dimers (), which spontaneously transiting from the excited state to the ground state result in the emission of UV photons.
These lamps produce light across a broad spectrum with several strong peaks in the ultraviolet range. This spectrum is filtered to select a single spectral line. From the early 1960s through the mid-1980s, Hg lamps had been used in lithography for their spectral lines at 436 nm ("g-line"), 405 nm ("h-line") and 365 nm ("i-line").
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