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  2. Depth of focus - Wikipedia

    en.wikipedia.org/wiki/Depth_of_focus

    The phrase depth of focus is sometimes erroneously used to refer to depth of field (DOF), which is the distance from the lens in acceptable focus, whereas the true meaning of depth of focus refers to the zone behind the lens wherein the film plane or sensor is placed to produce an in-focus image. Depth of field depends on the focus distance ...

  3. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer .

  4. Immersion lithography - Wikipedia

    en.wikipedia.org/wiki/Immersion_lithography

    The lenses in the highest resolution "dry" photolithography scanners focus light in a cone whose boundary is nearly parallel to the wafer surface. As it is impossible to increase resolution by further refraction, additional resolution is obtained by inserting an immersion medium with a higher index of refraction between the lens and the wafer.

  5. Depth of field - Wikipedia

    en.wikipedia.org/wiki/Depth_of_field

    Acceptably sharp focus" is defined using a property called the "circle of confusion". The depth of field can be determined by focal length, distance to subject (object to be imaged), the acceptable circle of confusion size, and aperture. [2] Limitations of depth of field can sometimes be overcome with various techniques and equipment.

  6. Science of photography - Wikipedia

    en.wikipedia.org/wiki/Science_of_photography

    The range of distances that are nearly in focus is called the depth of field. Depth of field generally increases with decreasing aperture diameter (increasing f-number). The unfocused blur outside the depth of field is sometimes used for artistic effect in photography. The subjective appearance of this blur is known as bokeh.

  7. Electron-beam lithography - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_lithography

    An example of Electron beam lithograph setup. Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). [1]

  8. Hyperfocal distance - Wikipedia

    en.wikipedia.org/wiki/Hyperfocal_distance

    Depth of Field is precisely the same as depth of focus, only in the former case the depth is measured by the movement of the plate, the object being fixed, while in the latter case the depth is measured by the distance through which the object can be moved without the circle of confusion exceeding 2 e.

  9. Telecentric lens - Wikipedia

    en.wikipedia.org/wiki/Telecentric_lens

    Bi-telecentric lens with 208 mm diameter front element and a C-mount camera interface 3D render simulating a photo taken with a fixed focal length and a telecentric lens. A telecentric lens is a special optical lens (often an objective lens or a camera lens) that has its entrance or exit pupil, or both, at infinity.