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  2. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).

  3. Einzel lens - Wikipedia

    en.wikipedia.org/wiki/Einzel_lens

    Implementation of an einzel lens showing the ion path. Six plates are parallel to the ion flight path with the middle plate at a particular potential. An einzel lens (from German: Einzellinse – single lens [1]), or unipotential lens, [2] is a charged particle electrostatic lens that focuses without changing the energy of the beam. It consists ...

  4. Electrostatic lens - Wikipedia

    en.wikipedia.org/wiki/Electrostatic_lens

    An electrostatic lens is a device that assists in the transport of charged particles. [1] [2] [3] For instance, it can guide electrons emitted from a sample to an electron analyzer, analogous to the way an optical lens assists in the transport of light in an optical instrument.

  5. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.

  6. Ion beam lithography - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_lithography

    Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move in straighter paths than electrons do both through vacuum and through matter, so there seems be a potential for very high resolution.

  7. Main Magnetic Focus Ion Source - Wikipedia

    en.wikipedia.org/wiki/Main_Magnetic_Focus_Ion_Source

    Photo: The MaMFIS operating at electron beam energy of up to 4 keV and electron current density of about 20 kA/cm 2. Main Magnetic Focus Ion Source (MaMFIS) is a compact ion source with extremely high electron current density. The device is designed for production of ions of arbitrary elements in any charge states, in particular, of highly ...

  8. Ion gun - Wikipedia

    en.wikipedia.org/wiki/Ion_Gun

    The ion current density is controlled by the ion source, the energy spread is determined primarily by the extraction grid, and the resolution is determined primarily by the optical column. The ion gun is an important component in surface science in that it provides the scientist with a means to sputter etch a surface and generate an elemental ...

  9. Ion source - Wikipedia

    en.wikipedia.org/wiki/Ion_source

    The Electron beam ion trap (EBIT), based on the same principle, can produce up to bare uranium ions and can be used as an ion source as well. Heavy ions can also be generated with an ion gun which typically uses the thermionic emission of electrons to ionize a substance in its gaseous state.