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A cloth face mask is a mask made of common textiles, usually cotton, worn over the mouth and nose.When more effective masks are not available, and when physical distancing is impossible, cloth face masks are recommended by public health agencies for disease "source control" in epidemic situations to protect others from virus laden droplets in infected mask wearers' breath, coughs, and sneezes.
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This image is a work of the National Institute for Occupational Safety and Health, part of the Centers for Disease Control and Prevention in the United States Department of Health and Human Services, taken or made as part of an employee's official duties.
The mask was designed to incorporate state-of-the-art technology to protect soldiers from current and anticipated threats from all types of weapons of mass destruction. It is an above-the-neck, chemical - biological (CB) respirator that protects against battlefield concentrations of CB agents, toxins , toxic industrial materials, and ...
Original file (725 × 612 pixels, file size: 52 KB, MIME type: application/pdf, 2 pages) This is a file from the Wikimedia Commons . Information from its description page there is shown below.
Surgical mask; Cloth face mask; Dust mask; Diving mask, for use underwater; Facemask (orthodontics), used for correcting teeth misalignments; Facial mask, used for cosmetic skin treatment; Face mask (gridiron football), in sports; A mask for the face, typically used in rituals, performance art and as a disguise mostly during the Halloween holiday.
In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry.
Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.
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