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In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry.
Australian law refers to mask works as "eligible layouts" or ELs. [2] In Canada these rights are protected under the [Integrated Circuit Topography Act (1990, c. 37)]. In the European Union, a sui generis design right protecting the design of materials was introduced by the Directive 87/54/EEC which is transposed in all member states.
The result of the sublimation process is a nearly permanent, high resolution, full color print. Because the dyes are infused into the substrate at the molecular level, rather than applied at a topical level (such as with screen printing and direct to garment printing), the prints will not crack, fade or peel from the substrate under normal ...
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