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  2. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  3. Calo tester - Wikipedia

    en.wikipedia.org/wiki/Calo_tester

    The Calo tester, also known as a ball crater or coating thickness tester, is a simple and inexpensive piece of equipment used to measure the thickness of coatings.Coatings with thicknesses typically between 0.1 to 50 micrometres, such as Physical Vapor Deposition (PVD) coatings or Chemical Vapor Deposition (CVD) coatings, are used in many industries to improve the surface properties of tools ...

  4. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. [1] [2]

  5. Category:Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Physical_vapor...

    Pages in category "Physical vapor deposition" The following 3 pages are in this category, out of 3 total. This list may not reflect recent changes. C. Calo tester; N.

  6. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    When the vapor source is a liquid or solid, the process is called physical vapor deposition (PVD), [3] which is used in semiconductor devices, thin-film solar panels, and glass coatings. [4] When the source is a chemical vapor precursor, the process is called chemical vapor deposition (CVD).

  7. High-power impulse magnetron sputtering - Wikipedia

    en.wikipedia.org/wiki/High-power_impulse...

    High-power impulse magnetron sputtering (HIPIMS or HiPIMS, also known as high-power pulsed magnetron sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition.

  8. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...

  9. Sublimation sandwich method - Wikipedia

    en.wikipedia.org/wiki/Sublimation_sandwich_method

    The sublimation sandwich method (also called the sublimation sandwich process and the sublimation sandwich technique) is a kind of physical vapor deposition used for creating man-made crystals. Silicon carbide is the most common crystal grown this way, though other crystals may also be created with it (notably gallium nitride).

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