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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
ASML has orders for more than a dozen, though TSMC, its biggest customer for EUV equipment, has said it does not need to use High NA tools for its A16 chips, expected to enter production in 2025 ...
Meteor Lake is built using four different fabrication nodes, including both Intel's own nodes and external nodes outsourced to fabrication competitor TSMC. The "Intel 4" process used for the CPU tile is the first process node in which Intel is utilising extreme ultraviolet (EUV) lithography, which is necessary for creating nodes 7nm and smaller ...
At the 2016 EUVL Workshop, ASML reported that the 0.33 NA NXE EUV tools would not be capable of standard single exposure patterning for the 11-13 nm half-pitch expected at the 5 nm node. [98] A higher NA of 0.55 would allow single exposure EUV patterning of fields which are half the 26 mm x 33 mm standard field size. [ 98 ]
AMSTERDAM (Reuters) -Dutch semiconductor equipment maker ASML said on Thursday it is shipping the first of its new "High NA" extreme ultraviolet lithography systems to Intel Corp. ASML published ...
ASML is working on the next generation of EUV systems, with the first shipments for R&D purposes shipped to Intel in December 2023, and TSMC in late 2024. [19] [20] The platform is designated High-NA as it increases the numerical aperture (NA) from 0.33 to 0.55, [17] and each system costs approximately $370 million. [2] [20]
Both chips were manufactured by TSMC. [10] In 2019, [11] AMD released their "Rome" (EPYC 2) processors for servers and datacenters, which are based on TSMC's N7 node [12] and feature up to 64 cores and 128 threads. They also released their "Matisse" consumer desktop processors with up to 16
13.5 nm extreme ultraviolet (EUV) lithography, long considered a leading candidate for next-generation lithography, began to enter commercial mass-production in 2018. [1] As of 2021, Samsung and TSMC were gradually phasing EUV lithography into their production lines, as it became economical to replace multiple processing steps with single EUV ...