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  2. Ion milling machine - Wikipedia

    en.wikipedia.org/wiki/Ion_milling_machine

    Ion milling is a specialized physical etching technique that is a crucial step in the preparation of material analysis techniques. After a specimen goes through ion milling, the surface becomes much smoother and more defined, which allows scientists to study the material much easier.

  3. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).

  4. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...

  5. Ion beam analysis - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_analysis

    Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.

  6. Ion-beam sculpting - Wikipedia

    en.wikipedia.org/wiki/Ion-beam_sculpting

    This technique uses a broad area argon ion source beam. If the hole is blind (a blind hole is a hole that has not broken through on the backside yet) the wafer (often SiN or silicon/silicon oxide) is then turned upside down, and exposed with the argon beam. A detector counts the amount of ions passing through the membrane (which should be zero).

  7. Ion beam mixing - Wikipedia

    en.wikipedia.org/wiki/Ion_Beam_Mixing

    This temperature-dependence is a manifestation of incident ion beams effectively imparting the target species-dependent activation energy to the barrier layer. [3] Ballistic ion beam mixing can be classified into two basic subtypes, recoil mixing and cascade mixing, which take place simultaneously as a result of ion bombardment.

  8. Norio Taniguchi - Wikipedia

    en.wikipedia.org/wiki/Norio_Taniguchi

    Norio Taniguchi (谷口 紀男, Taniguchi Norio, May 27, 1912 – November 15, 1999) was a professor of Tokyo University of Science.He coined the term nano-technology in 1974 [1] to describe semiconductor processes such as thin film deposition and ion beam milling exhibiting characteristic control on the order of a nanometer: "Nano-technology"

  9. Scanning helium ion microscope - Wikipedia

    en.wikipedia.org/wiki/Scanning_Helium_Ion_Microscope

    A scanning helium ion microscope (SHIM, HeIM or HIM) is an imaging technology based on a scanning helium ion beam. [2] Similar to other focused ion beam techniques, it allows to combine milling and cutting of samples with their observation at sub-nanometer resolution.