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The manufacturing of thick film devices/modules is an additive process involving deposition of several (typically max 6–8) successive layers of conductive, resistive and dielectric layers onto an electrically insulating substrate using a screen-printing process. [3] Thick Film Resistor Networks
Laser trimming is the manufacturing process of using a laser to adjust the operating parameters of an electronic circuit. Laser-trimmed precision thin-film resistor network from Fluke, used in the Keithley DMM7510 multimeter. Ceramic backed with glass hermetic seal cover. Laser trim marks are visible in the grey resistive material.
The film is then etched in a similar manner to the old (subtractive) process for making printed circuit boards; that is, the surface is coated with a photo-sensitive material, covered by a pattern film, irradiated with ultraviolet light, and then the exposed photo-sensitive coating is developed, and underlying thin film is etched away.
A thin film is a layer of materials ranging from fractions of a nanometer to several micrometers in thickness. [1] The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications.
The film is then etched in a similar manner to the old (subtractive) process for making printed circuit boards; that is, the surface is coated with a photo-sensitive material, covered by a pattern film, irradiated with ultraviolet light, and then the exposed photo-sensitive coating is developed, and underlying thin film is etched away.
Molecular-beam epitaxy (MBE) is an epitaxy method for thin-film deposition of single crystals. MBE is widely used in the manufacture of semiconductor devices , including transistors . [ 1 ] MBE is used to make diodes and MOSFETs (MOS field-effect transistors ) at microwave frequencies, and to manufacture the lasers used to read optical discs ...
In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps.
Layer-by-layer (LbL) deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of complementary materials with wash steps in between. This can be accomplished by using various techniques such as immersion, spin, spray, electromagnetism, or fluidics. [1]
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