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Methyltrichlorosilane is used as a reagent in silicon carbide epitaxy to introduce chloride in the gas phase. Chloride is used to reduce the tendency of silicon to react in the gas phase and thus to increase the growth rate of the process. [6] Methyltrichlorosilane is an alternative to HCl gas or to trichlorosilane.
Methyltrichlorosilane can be used to induce branching and cross-linking in PDMS molecules, while chlorotrimethylsilane serves to end backbone chains, limiting molecular weight. Other acid-forming species, especially acetate, can replace chlorine in silicone synthesis with little difference in the chemistry of the finished polymer. These ...
Trichlorosilane can cause hazardous chemical reactions with moisture and humidity alone, and should be handled and stored under inert gas. [8] Spills of trichlorosilane may be neutralized using a 1-1 ratio of sodium hydroxide , or a 2-1 ratio of sodium bicarbonate to trichlorosilane. [ 9 ]
The more useful products of this reaction are those for x = 1 (trimethylsilyl chloride), 2 (dimethyldichlorosilane), and 3 (methyltrichlorosilane). [1] TMS undergoes deprotonation upon treatment with butyllithium to give (H 3 C) 3 SiCH 2 Li. The latter, trimethylsilylmethyl lithium, is a relatively common alkylating agent.
Water-reactive substances [1] are those that spontaneously undergo a chemical reaction with water, often noted as generating flammable gas. [2] Some are highly reducing in nature. [ 3 ] Notable examples include alkali metals , lithium through caesium , and alkaline earth metals , magnesium through barium .
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The solubility of gas obeys Henry's law, that is, the amount of a dissolved gas in a liquid is proportional to its partial pressure. Therefore, placing a solution under reduced pressure makes the dissolved gas less soluble. Sonication and stirring under reduced pressure can usually enhance the efficiency.