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  2. Pulsed laser deposition - Wikipedia

    en.wikipedia.org/wiki/Pulsed_laser_deposition

    A plume ejected from a SrRuO 3 target during pulsed laser deposition. One possible configuration of a PLD deposition chamber. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.

  3. Laser ablation - Wikipedia

    en.wikipedia.org/wiki/Laser_ablation

    A variation of this type of application is to use laser ablation to create coatings by ablating the coating material from a source and letting it deposit on the surface to be coated; this is a special type of physical vapor deposition called pulsed laser deposition (PLD), [8] and can create coatings from materials that cannot readily be ...

  4. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Evaporative deposition: the material to be deposited is heated to a high vapor pressure by electrical resistance heating in "high" vacuum. [4] [5] Close-space sublimation, the material, and substrate are placed close to one another and radiatively heated. Pulsed laser deposition: a high-power laser ablates material from the target into a vapor.

  5. Pulsed laser - Wikipedia

    en.wikipedia.org/wiki/Pulsed_laser

    Pulsed operation of lasers refers to any laser not classified as continuous wave, so that the optical power appears in pulses of some duration at some repetition rate. [1] This encompasses a wide range of technologies addressing a number of different motivations. Some lasers are pulsed simply because they cannot be run in continuous mode.

  6. Thermal laser epitaxy - Wikipedia

    en.wikipedia.org/wiki/Thermal_Laser_Epitaxy

    Thermal laser epitaxy (TLE) is a physical vapor deposition technique that utilizes irradiation from continuous-wave lasers to heat sources locally for growing films on a substrate. [ 1 ] [ 2 ] This technique can be performed under ultra-high vacuum pressure or in the presence of a background atmosphere, such as ozone , to deposit oxide films.

  7. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres. Molecular beam epitaxy, the Langmuir–Blodgett method, atomic layer deposition and molecular layer deposition allow a single layer of atoms or molecules to be deposited at a time.

  8. Transition metal dichalcogenide monolayers - Wikipedia

    en.wikipedia.org/wiki/Transition_metal...

    Pulsed laser deposition involves the thinning of bulk molybdenum disulfide by laser to produce single or multi-layer molybdenum disulfide nanosheets. [97] This allows for synthesis of molybdenum disulfide nanosheets with a defined shape and size. [102] The quality of the nanosheets are determined by the energy of the laser and the irradation angle.

  9. Coating - Wikipedia

    en.wikipedia.org/wiki/Coating

    Methods of achieving this range from a simple brush to expensive precision machinery in the electronics industry. Limiting coating area is crucial in some applications, such as printing . "Roll-to-roll" or "web-based" coating is the process of applying a thin film of functional material to a substrate on a roll, such as paper, fabric , film ...