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  2. Thick-film technology - Wikipedia

    en.wikipedia.org/wiki/Thick-film_technology

    The manufacturing of thick film devices/modules is an additive process involving deposition of several (typically max 6–8) successive layers of conductive, resistive and dielectric layers onto an electrically insulating substrate using a screen-printing process. [3] Thick Film Resistor Networks

  3. Laser trimming - Wikipedia

    en.wikipedia.org/wiki/Laser_trimming

    Laser trimming is the manufacturing process of using a laser to adjust the operating parameters of an electronic circuit. Laser-trimmed precision thin-film resistor network from Fluke, used in the Keithley DMM7510 multimeter. Ceramic backed with glass hermetic seal cover. Laser trim marks are visible in the grey resistive material.

  4. Sheet resistance - Wikipedia

    en.wikipedia.org/wiki/Sheet_resistance

    Resistor based on the sheet resistance of carbon film. Sheet resistance is the resistance of a square piece of a thin material with contacts made to two opposite sides of the square. [1] It is usually a measurement of electrical resistance of thin films that are uniform in thickness.

  5. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    A thin film is a layer of materials ranging from fractions of a nanometer to several micrometers in thickness. [1] The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications.

  6. Integrated passive devices - Wikipedia

    en.wikipedia.org/wiki/Integrated_passive_devices

    Manufacturing of IPDs used include thick [12] and thin film [13] [14] technologies and variety of integrated circuit processing steps or modifications (like thicker or different metals than aluminum or copper) of them. Integrated passives are available as standard components/parts or as custom designed (for a specific application) devices.

  7. Microfabrication - Wikipedia

    en.wikipedia.org/wiki/Microfabrication

    These processes typically include depositing a film, patterning the film with the desired micro features, and removing (or etching) portions of the film. Thin film metrology is used typically during each of these individual process steps, to ensure the film structure has the desired characteristics in terms of thickness (t), refractive index (n ...

  8. X-ray lithography - Wikipedia

    en.wikipedia.org/wiki/X-ray_lithography

    X-ray lithography is a process used in semiconductor device fabrication industry to selectively remove parts of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist, or simply "resist," on the substrate to reach extremely small topological size of a feature.

  9. Layer by layer - Wikipedia

    en.wikipedia.org/wiki/Layer_by_layer

    Layer-by-layer (LbL) deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of complementary materials with wash steps in between. This can be accomplished by using various techniques such as immersion, spin, spray, electromagnetism, or fluidics. [1]

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