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The focused ion beam has become a powerful tool for site-specific 3D imaging of sub-micron features in a sample. In this FIB tomography technique, the sample is sequentially milled using an ion beam perpendicular to the specimen while imaging the newly exposed surface using an electron beam.
Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.
In plasma physics, an ion acoustic wave is one type of longitudinal oscillation of the ions and electrons in a plasma, much like acoustic waves traveling in neutral gas. However, because the waves propagate through positively charged ions, ion acoustic waves can interact with their electromagnetic fields , as well as simple collisions.
Rather than shining a monochromatic beam of light (a beam composed of only a single wavelength) at the sample, this technique shines a beam containing many frequencies of light at once and measures how much of that beam is absorbed by the sample. Next, the beam is modified to contain a different combination of frequencies, giving a second data ...
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
For a minimal introduction of stress and bending to transmission electron microscopy (TEM) samples (lamellae, thin films, and other mechanically and beam sensitive samples), when transferring inside a focused ion beam (FIB), flexible metallic nanowires can be attached to a typically rigid micromanipulator.
The basic layout of an ion beam apparatus is an accelerator which produces an ion beam that is feed through an evacuated beam-transport tube to a beam handling device. This device isolates the ion species and charge of interest which then are transported through an evacuated beam-transport tube into the target chamber.
As the helium ion beam interacts with the sample, it does not suffer from a large excitation volume, and hence provides sharp images with a large depth of field on a wide range of materials. Compared to a SEM, the secondary electron yield is quite high, allowing for imaging with currents as low as 1 femtoamp. The detectors provide information ...
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