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The concept of a laser level has been around since at least the early 1970s, [2] the original spinning-mirror design laser plane and line level was patented by the late 1980s, [3] and the compact lens-based laser line level (as produced by many tool manufacturers today) was patented in the late 1990s. It was invented by Oscar Soliz in the late ...
A laser line level is a tool combining a spirit level and/or plumb bob with a laser to display an accurately horizontal or vertical illuminated line on a surface the laser line level is laid against. Laser line levels are used wherever accurate verticals and horizontals are required, typically in the construction and cabinetry industries. Some ...
Line laser with interchangeable lenses. A line laser is a device that employs a laser and an optical lens to project the laser beam as a line rather than a point (e.g. laser pointer). This may be achieved by passing the beam through a cylindrical lens or a Powell lens. [1]
Optical pumping is a process in which light is used to raise (or "pump") electrons from a lower energy level in an atom or molecule to a higher one. It is commonly used in laser construction to pump the active laser medium so as to achieve population inversion. The technique was developed by the 1966 Nobel Prize winner Alfred Kastler in the ...
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
6) defines the beam diameter as the distance between diametrically opposed points in that cross-section of a beam where the power per unit area is 1/e (0.368) times that of the peak power per unit area. This is the beam diameter definition that is used for computing the maximum permissible exposure to a laser beam.
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