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UV mapping is the 3D modeling process of projecting a 3D model's surface to a 2D image for texture mapping. The letters "U" and "V" denote the axes of the 2D texture because "X", "Y", and "Z" are already used to denote the axes of the 3D object in model space, while "W" (in addition to XYZ) is used in calculating quaternion rotations, a common ...
The Design 3D CX 7.0 release in 2012 included texture enhancements such as anisotropy and normal map support, blurry transparency and subsets for applying different textures to different groups of polygons in the same object. Also included in 7.0 is a full UV editor, new polygon selection and editing tools, render and speed improvements.
Version 2.0 [4] added UV unwrapping tools and a selection of 3D painting tools, though these are still quite basic and do not include layers. Also added was the facility to paint in displacement, or "3D sculpting ", which makes Hexagon particularly well suited for organic modeling.
The OBJ file format is a simple data-format that represents 3D geometry alone — namely, the position of each vertex, the UV position of each texture coordinate vertex, vertex normals, and the faces that make each polygon defined as a list of vertices, and texture vertices. Vertices are stored in a counter-clockwise order by default, making ...
Shade 3D is a 3D modeling, rendering, animation, 3D printing computer program developed by e frontier Japan and published by Mirye Software. [1] In October 2013, Shade 3D development team formed a new company called Shade3D Co., Ltd., and continue to develop and market the program. [2]
LightWave is a software package used for rendering 3D images, both animated and static. It includes a fast rendering engine that supports such advanced features as realistic reflection, radiosity , caustics , and 999 render nodes .
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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.