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  2. Piranha solution - Wikipedia

    en.wikipedia.org/wiki/Piranha_solution

    Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers. [1] Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most ...

  3. Surface treatment of PTFE - Wikipedia

    en.wikipedia.org/wiki/Surface_treatment_of_PTFE

    Sodium treated PTFE will degrade with exposure to UV radiation. Immediately after sodium treatment, the PTFE surface is dark brown. The weaker the etching solution, the lighter the color change and the weaker the bond will be. [1] When exposed to UV radiation, the treated PTFE will gradually return to its original white color.

  4. Piranha etch - Wikipedia

    en.wikipedia.org/?title=Piranha_etch&redirect=no

    This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...

  5. How to Refinish an Old Bathtub So It Looks New

    www.aol.com/refinish-old-bathtub-shines...

    Etching powder isn't a required, but it can help you remove the old glaze more easily and completely, which may allow the new glaze to adhere better. If your chosen kit does not come with etching ...

  6. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  7. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America. [1][2][3] It involves the following ...

  8. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    Wet etching was widely used in the 1960s and 1970s, [133] [134] but it was replaced by dry etching/plasma etching starting at the 10 micron to 3 micron nodes. [135] [136] This is because wet etching makes undercuts (etching under mask layers or resist layers with patterns). [137] [138] [139] Dry etching has become the dominant etching technique ...

  9. Phosphate conversion coating - Wikipedia

    en.wikipedia.org/wiki/Phosphate_conversion_coating

    Phosphate conversion coating. Phosphate conversion coating is a chemical treatment applied to steel parts that creates a thin adhering layer of iron, zinc, or manganese phosphates, to achieve corrosion resistance, lubrication, or as a foundation for subsequent coatings or painting. [1][2][3] It is one of the most common types of conversion ...