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  2. Glass etching - Wikipedia

    en.wikipedia.org/wiki/Glass_etching

    186 etched glass at Bankfield Museum. Glass etching, or " French embossing ", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances.

  3. Buffered oxide etch - Wikipedia

    en.wikipedia.org/wiki/Buffered_oxide_etch

    Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH4F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO2 + 4HF + 2NH4F → (NH4 ...

  4. Ammonium bifluoride - Wikipedia

    en.wikipedia.org/wiki/Ammonium_bifluoride

    Ammonium bifluoride is a component of some etchants. It attacks silica component of glass: SiO 2 + 4 [NH 4][HF 2] → SiF 4 + 4 [NH 4]F + 2 H 2 O. Potassium bifluoride is a related more commonly used etchant. Ammonium bifluoride has been considered as an intermediate in the production of hydrofluoric acid from hexafluorosilicic acid.

  5. Nitric acid - Wikipedia

    en.wikipedia.org/wiki/Nitric_acid

    A solution of nitric acid, water and alcohol, nital, is used for etching metals to reveal the microstructure. ISO 14104 is one of the standards detailing this well known procedure. [46] Nitric acid is used either in combination with hydrochloric acid or alone to clean glass cover slips and glass slides for high-end microscopy applications. [47]

  6. Tetramethylammonium hydroxide - Wikipedia

    en.wikipedia.org/wiki/Tetramethylammonium_hydroxide

    Infobox references. Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with molecular formula N (CH 3) 4+ OH −. It is commonly encountered in form of concentrated solutions in water or methanol. TMAH in solid state and its aqueous solutions are all colorless, but may be yellowish if impure.

  7. Piranha solution - Wikipedia

    en.wikipedia.org/wiki/Piranha_solution

    Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers. [1] Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most ...

  8. Chemical milling - Wikipedia

    en.wikipedia.org/wiki/Chemical_milling

    A high-purity (≥99.9998%) aluminium bar that has been etched to reveal the component crystallites. Chemical milling or industrial etching is the subtractive manufacturing process of using baths of temperature-regulated etching chemicals to remove material to create an object with the desired shape. [1][2] Other names for chemical etching ...

  9. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which ...