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They range from those of water at very low concentrations approaching 0% HCl to values for fuming hydrochloric acid at over 40% HCl. [31] [32] [33] Hydrochloric acid as the binary (two-component) mixture of HCl and H 2 O has a constant-boiling azeotrope at 20.2% HCl and 108.6 °C (381.8 K; 227.5 °F).
A weak acid cannot always be neutralized by a weak base, and vice versa. However, for the neutralization of benzoic acid (K a,A = 6.5 × 10 −5) with ammonia (K a,B = 5.6 × 10 −10 for ammonium), K = 1.2 × 10 5 >> 1, and more than 99% of the benzoic acid is converted to benzoate.
A typical mixture is 3 parts of concentrated sulfuric acid and 1 part of 30 wt. % hydrogen peroxide solution; [1] other protocols may use a 4:1 or even 7:1 mixture. A closely related mixture, sometimes called "base piranha", is a 5:1:1 mixture of water, ammonia solution ( NH 4 OH , or NH 3 (aq) ), and 30% hydrogen peroxide.
The process was based on the oxidation of hydrogen chloride: 4 HCl + O 2 → 2 Cl 2 + 2H 2 O. The reaction takes place at about 400 to 450 °C in the presence of a variety of catalysts, including copper chloride (CuCl 2). Three companies developed commercial processes for producing chlorine based on the Deacon reaction: [1]
McIlvaine buffer is a buffer solution composed of citric acid and disodium hydrogen phosphate, also known as citrate-phosphate buffer.It was introduced in 1921 by the United States agronomist Theodore Clinton McIlvaine (1875–1959) from West Virginia University, and it can be prepared in pH 2.2 to 8 by mixing two stock solutions.
Normality can be used for acid-base titrations. For example, sulfuric acid (H 2 SO 4) is a diprotic acid. Since only 0.5 mol of H 2 SO 4 are needed to neutralize 1 mol of OH −, the equivalence factor is: f eq (H 2 SO 4) = 0.5. If the concentration of a sulfuric acid solution is c(H 2 SO 4) = 1 mol/L, then its normality is 2 N. It can also be ...
Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH 4 F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO 2 + 4HF + 2NH 4 F → ...
The commercially most relevant field of application for HCl regeneration processes is the recovery of HCl from waste pickle liquors from carbon-steel pickling lines. Other applications include the production of metal oxides such as, but not limited, to Al 2 O 3 and MgO, as well as rare-earth oxides, by pyrohydrolysis of aqueous metal chloride or rare-earth chloride solutions.