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  2. Electron-beam lithography - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_lithography

    An example of Electron beam lithograph setup. Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). [1]

  3. ANSI device numbers - Wikipedia

    en.wikipedia.org/wiki/ANSI_device_numbers

    The "G" suffix can also mean "generator", hence an "87G" is a Generator Differential Protective Relay while an "87T" is a Transformer Differential Protective Relay. "F" can denote "field" on a generator or "fuse", as in the protective fuse for a pickup transformer.

  4. Relay - Wikipedia

    en.wikipedia.org/wiki/Relay

    A relay Electromechanical relay principle Electromechanical relay schematic showing a control coil, four pairs of normally open and one pair of normally closed contacts An automotive-style miniature relay with the dust cover taken off. A relay is an electrically operated switch. It consists of a set of input terminals for a single or multiple ...

  5. DIN 72552 - Wikipedia

    en.wikipedia.org/wiki/DIN_72552

    from 2nd battery and 12/24 V relay: 31 return to battery- or direct to ground 31a return to battery- 12/24 V relay 31b return to battery- or ground through switch 85d 31c return to battery- 12/24 V relay 31, 31a Electric motors; 32 return 31 33 main terminal (swap of 32 and 33 is possible) 30 33a limit 33b field 54e 33f 2. slow rpm: 33g 3. slow ...

  6. Protective relay - Wikipedia

    en.wikipedia.org/wiki/Protective_relay

    This relay operates only when the impedance between the source and the relay is less than that provided in the section. [33] An inverse-time over-current (ITOC) relay is an overcurrent relay which operates only when the magnitude of their operating current is inversely proportional to the magnitude of the energize quantities. The operating time ...

  7. Proximity effect (electron beam lithography) - Wikipedia

    en.wikipedia.org/wiki/Proximity_effect_(electron...

    The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider than the scanned pattern due to the interactions of the primary beam electrons with the resist and substrate. These cause the resist outside the scanned pattern to receive a non-zero dose.

  8. Utilization categories - Wikipedia

    en.wikipedia.org/wiki/Utilization_categories

    Definition [ edit ] The utilization categories category for low-voltage switchgear defines the characteristic operating conditions for switchgear such as contactors, circuit-breakers, circuit-breaker-fuse units, contactor relays, etc.

  9. Extragalactic background light - Wikipedia

    en.wikipedia.org/wiki/Extragalactic_background_light

    The EBL is part of the diffuse extragalactic background radiation (DEBRA), which by definition covers the entire electromagnetic spectrum. After the cosmic microwave background, the EBL produces the second-most energetic diffuse background, thus being essential for understanding the full energy balance of the universe.