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Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...
Chemical milling or industrial etching is the subtractive manufacturing process of using baths of temperature-regulated etching chemicals to remove material to create an object with the desired shape. [1] [2] Other names for chemical etching include photo etching, chemical etching, photo chemical etching and photochemical machining. It is ...
Fat removal procedures are used mostly in cosmetic surgery with the intention of removing unwanted adipose tissue.The procedure may be invasive, as with liposuction, [1] or noninvasive using laser therapy, radiofrequency, ultrasound or cold (cryoablation or cryolipolysis) to reduce fat, sometimes in combination with injections.
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching . RIE uses chemically reactive plasma to remove material deposited on wafers .
ferric chloride may be used for etching copper or zinc plates, whereas nitric acid may be used for etching zinc or steel plates. Typical solutions are 1 part FeCl 3 to 1 part water and 1 part nitric to 3 parts water. The strength of the acid determines the speed of the etching process. The etching process is known as biting (see also spit ...
Liposuction, or simply lipo, is a type of fat-removal procedure used in plastic surgery. [1] Evidence does not support an effect on weight beyond a couple of months and does not appear to affect obesity-related problems. [2] [3] In the United States, liposuction is the most common cosmetic surgery. [4] [5]
The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw custom patterns (direct-write) with sub-10 nm resolution.
The probe tip acts as a nano-pen, and can pattern nanoparticles into a programmed structure. Depending on the size of the nanoparticles, resolutions of 78–400 nm were attained. An O 2 plasma etch can be used to remove the PMMA matrix, and in the case of Iron Oxide nanoparticles, further reduce the resolution of lines to 10 nm. [22]