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  2. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    Etching by Daniel Hopfer, who is believed to have been the first to apply the technique to printmaking. Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio (incised) in the metal. [1] In modern manufacturing, other chemicals may be used on other ...

  3. Glass etching - Wikipedia

    en.wikipedia.org/wiki/Glass_etching

    Glass etching, or " French embossing ", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances. Traditionally this is done after the glass is ...

  4. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which ...

  5. Chemical milling - Wikipedia

    en.wikipedia.org/wiki/Chemical_milling

    Chemical milling or industrial etching is the subtractive manufacturing process of using baths of temperature-regulated etching chemicals to remove material to create an object with the desired shape. [1][2] Other names for chemical etching include photo etching, chemical etching, photo chemical etching and photochemical machining.

  6. Buffered oxide etch - Wikipedia

    en.wikipedia.org/wiki/Buffered_oxide_etch

    Buffered oxide etch. Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH4F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction:

  7. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    Wet etching was widely used in the 1960s and 1970s, [144] [145] but it was replaced by dry etching/plasma etching starting at the 10 micron to 3 micron nodes. [146] [147] This is because wet etching makes undercuts (etching under mask layers or resist layers with patterns). [148] [149] [150] Dry etching has become the dominant etching technique ...

  8. Drypoint - Wikipedia

    en.wikipedia.org/wiki/Drypoint

    Drypoint. Drypoint is a printmaking technique of the intaglio family, in which an image is incised into a plate (or "matrix") with a hard-pointed "needle" of sharp metal or diamond point. In principle, the method is practically identical to engraving. The difference is in the use of tools, and that the raised ridge along the furrow is not ...

  9. Printmaking - Wikipedia

    en.wikipedia.org/wiki/Printmaking

    Like etching, aquatint technique involves the application of acid to make marks in a metal plate. Where the etching technique uses a needle to make lines that retain ink, traditional aquatint relies on powdered rosin which is acid resistant in the ground to create a tonal effect. The rosin is applied in a light dusting by a fan booth, the rosin ...

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