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An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
In particle accelerators an ion source creates a particle beam at the beginning of the machine, the source. The technology to create ion sources for particle accelerators depends strongly on the type of particle that needs to be generated: electrons , protons , H − ion or a Heavy ions .
Another ion source seen in commercially available instruments is a helium ion source, which is inherently less damaging to the sample than Ga ions although it will still sputter small amounts of material especially at high magnifications and long scan times. As helium ions can be focused into a small probe size and provide a much smaller sample ...
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2] In the ion source ...
Ion implantation setup with mass separator. Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy or using radiofrequency, and a target chamber, where the ions impinge on a target, which is the material to be implanted.
The configuration of the ion beam apparatus can be changed and made more complex with the incorporation of additional components. The techniques for ion beam analysis are designed for specific purposes. Some techniques and ion sources are shown in table 1. Detector types and arrangements for ion beam techniques are shown in table 2.
Most focused ion beam instruments use a liquid-metal ion sources (LMIS) often with gallium. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle and heated gallium wets the tungsten and flows to the tip of the needle where the opposing forces of surface tension and electric field produce the cusp shaped Taylor cone.
Tandems locate the ion source outside the terminal, which means that accessing the ion source while the terminal is at high voltage is significantly less difficult, especially if the terminal is inside a gas tank. So then an anion beam from a sputtering ion source is injected from a relatively lower voltage platform towards the high voltage ...
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