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As the diagram on the right shows, the gallium (Ga+) primary ion beam hits the sample surface and sputters a small amount of material, which leaves the surface as either secondary ions (i+ or i−) or neutral atoms (n 0). The primary beam also produces secondary electrons (e −). As the primary beam rasters on the sample surface, the signal ...
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
Gas focusing, also known as ionic focusing.. Rather than being dispersed, a beam of charged particles travelling in an inert gas environment sometimes becomes narrower. This is ascribed to the generation of gas ions which diffuse outwards, neutralizing the particle beam globally, and producing an intense radial electric field which applies a radially inward force to the particles in the beam.
A secondary ion mass spectrometer consists of (1) a primary ion gun generating the primary ion beam, (2) a primary ion column, accelerating and focusing the beam onto the sample (and in some devices an opportunity to separate the primary ion species by Wien filter or to pulse the beam), (3) high vacuum sample chamber holding the sample and the ...
Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move in straighter paths than electrons do both through vacuum and through matter, so there seems be a potential for very high resolution.
Photo: The MaMFIS operating at electron beam energy of up to 4 keV and electron current density of about 20 kA/cm 2. Main Magnetic Focus Ion Source (MaMFIS) is a compact ion source with extremely high electron current density. The device is designed for production of ions of arbitrary elements in any charge states, in particular, of highly ...
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