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Neuropixels probes (or "Neuropixels") are electrodes developed in 2017 to record the activity of hundreds of neurons in the brain. The probes are based on CMOS technology and have 1,000 recording sites arranged in two rows on a thin, 1-cm long shank.
Silicon-based microelectrode arrays include two specific models: the Michigan and Utah arrays. Michigan arrays allow a higher density of sensors for implantation as well as a higher spatial resolution than microwire MEAs. They also allow signals to be obtained along the length of the shank, rather than just at the ends of the shanks.
Chronic brain-computer interfaces come in two varieties, stimulating and recording. Applications for stimulating interfaces include sensory prosthetics (cochlear implants), for example, are the most successful variety of sensory prosthetics) and deep brain stimulation therapies, while recording interfaces can be used for research applications and to record the activity of speech or motor ...
All three components are surgically implanted inside the body. Lead implantation may take place under local anesthesia or under general anesthesia ("asleep DBS"), such as for dystonia. A hole about 14 mm in diameter is drilled in the skull and the probe electrode is inserted stereotactically, using either frame-based or frameless stereotaxis. [14]
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(Brain–computer interface research also includes technology such as EEG arrays that allow interface between mind and machine but do not require direct implantation of a device.) Neural implants such as deep brain stimulation and vagus nerve stimulation are increasingly becoming routine for patients with Parkinson's disease and clinical ...
State attorneys general have launched a nationwide investigation into TikTok and its possible harmful effects on young users’ mental health, widening government scrutiny of the wildly popular ...
PIII-process with ECR-plasma source and magnetron. Plasma-immersion ion implantation (PIII) [1] or pulsed-plasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from the plasma by applying a high voltage pulsed DC or pure DC power supply and targeting them into a suitable substrate or electrode with a semiconductor wafer placed over it, so as to ...