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Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes.
Canon has achieved miniaturization at lower power consumption and lower cost with nanoimprint lithography (NIL), a new technology that is an alternative to conventional lithography technology. By enabling inexpensive production of patterns of 15nm or smaller, NIL is poised to revolutionize the semiconductor industry.
Nanoimprint lithography (NIL) is a material processing tool with a rapidly expanding scope of applications. Actuation of smart, shape changing materials via NIL imparts dynamic surface behaviors. NIL-based processing of semi-crystalline polymers facilitates improved performance in solar cell, field effect transistor, and ferroelectric memory ...
This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication...
Nanoimprint lithography (NIL) has emerged in recent years as a highly promising solution to build nanostructures at low cost. NIL has been widely employed for nanostructure thermoplastics as well as UV-curable and sol–gel resists over a large area.
Nanoimprint lithography is an emerging nanopatterning method, combining nanometer-scale resolution and high throughput. In a top-down approach, a rigid stamp with a surface relief is pressed into a thin film of soft material on a hard substrate.
Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication proces.
Nanoimprint lithography (NIL) is a simple mechanical lithography technique involving a stamp, or a template, pressed against a deformable imprint resist layer deposited on a substrate to make the contours of the template.
Nanoimprint lithography is a versatile technique with applications across all industries involving nanofabrication. Here we have discussed numerous examples of the impact of nanoimprinting on the fabrication of devices in the semiconductor industry, in optics and in the emerging field of plasmonics.
NanoImprint is a generic technology involving various approaches but keeping a common goal: the use of a stamp or mold to transfer a 2D or 3D pattern onto a surface or in a material’s thickness. The key element of the process, the mold or stamp, is to NanoImprint what the mask is to optical lithography. The specifics of NanoImprint processes ...