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A cloth face mask is a mask made of common textiles, usually cotton, worn over the mouth and nose.When more effective masks are not available, and when physical distancing is impossible, cloth face masks are recommended by public health agencies for disease "source control" in epidemic situations to protect others from virus laden droplets in infected mask wearers' breath, coughs, and sneezes.
An exfoliating mitt. The Italy towel, (Korean: 이태리 타올) also known as the Korean exfoliating mitt or Korean exfoliating towel (depending on the shape), [1] is a mass-produced bath product used to scrub and peel the outermost layer of skin; it was invented in Busan by Kim Won-jo (CEO of Hanil Textile) in 1967.
Salux cloth, also called Salux nylon, is a type of Japanese washcloth originating in 1966, made of part nylon and polyester. [1] [2] The cloth is known for its ability to soften and smooth skin. Salux may also reduce ingrown hairs after shaving and help with exfoliation. [3] Salux won the Japanese Invention Award in 1974. [4]
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Exfoliation methods used in Canada, 2011. Shown: top right, a bath sponge made of plastic mesh; lower right, a brush with a pumice stone on one side and a natural bristle brush on the other side, for foot exfoliation; lower left, a mud mask package for facial exfoliation; top left, a jar of perfumed body scrub to be used while bathing.
A washing mitt. A washing mitt is a piece of terry cloth shaped like a pouch that the hand fits in. It is used as a type of washcloth to aid in washing the body, for example, to apply soap to the body, and to remove the soap with a rinsed out washing mitt.
A washcloth, wash cloth, washrag (American English), or flannel (British English) is a rectangular or square piece of cloth used in washing the body. It can be used to apply or rinse off soap or shower gel, and provides additional friction to remove dirt or dead skin from the body. [ 1 ]
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).
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