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  2. Doping (semiconductor) - Wikipedia

    en.wikipedia.org/wiki/Doping_(semiconductor)

    In intrinsic crystalline silicon, there are approximately 5×10 22 atoms/cm 3. Doping concentration for silicon semiconductors may range anywhere from 10 13 cm −3 to 10 18 cm −3. Doping concentration above about 10 18 cm −3 is considered degenerate at room temperature. Degenerately doped silicon contains a proportion of impurity to ...

  3. Extrinsic semiconductor - Wikipedia

    en.wikipedia.org/wiki/Extrinsic_semiconductor

    In an extrinsic semiconductor, the concentration of doping atoms in the crystal largely determines the density of charge carriers, which determines its electrical conductivity, as well as a great many other electrical properties. This is the key to semiconductors' versatility; their conductivity can be manipulated over many orders of magnitude ...

  4. Spreading resistance profiling - Wikipedia

    en.wikipedia.org/wiki/Spreading_Resistance_Profiling

    The tool is used primarily for determining doping structures in silicon semiconductors. Deep and shallow profiles are shown in Figure 2. Figure 2 The shallow profile on the left, the deep profile on the right. Carrier concentration is plotted against depth. Regions with a net electron concentration are denoted as "n" (or n-type).

  5. Electron mobility - Wikipedia

    en.wikipedia.org/wiki/Electron_mobility

    The SI unit of velocity is m/s, and the SI unit of electric field is V/m. Therefore the SI unit of mobility is (m/s)/(V/m) = m 2 /(V⋅s). However, mobility is much more commonly expressed in cm 2 /(V⋅s) = 10 −4 m 2 /(V⋅s). Mobility is usually a strong function of material impurities and temperature, and is determined empirically.

  6. Wafer (electronics) - Wikipedia

    en.wikipedia.org/wiki/Wafer_(electronics)

    Silicon wafers are generally not 100% pure silicon, but are instead formed with an initial impurity doping concentration between 10 13 and 10 16 atoms per cm 3 of boron, phosphorus, arsenic, or antimony which is added to the melt and defines the wafer as either bulk n-type or p-type. [27]

  7. Donor (semiconductors) - Wikipedia

    en.wikipedia.org/wiki/Donor_(semiconductors)

    When substituting a Si atom in the crystal lattice, four of the valence electrons of phosphorus form covalent bonds with the neighbouring Si atoms but the fifth one remains weakly bonded. If that electron is liberated, the initially electro-neutral donor becomes positively charged (ionised).

  8. Semiconductor - Wikipedia

    en.wikipedia.org/wiki/Semiconductor

    The conductivity of silicon is increased by adding a small amount (of the order of 1 in 10 8) of pentavalent (antimony, phosphorus, or arsenic) or trivalent (boron, gallium, indium) atoms. [3] This process is known as doping, and the resulting semiconductors are known as doped or extrinsic semiconductors. Apart from doping, the conductivity of ...

  9. Drude model - Wikipedia

    en.wikipedia.org/wiki/Drude_model

    The number density of the electron gas was assumed to be =, where Z is the effective number of de-localized electrons per ion, for which Drude used the valence number, A is the atomic mass per mole, [Ashcroft & Mermin 10] is the mass density (mass per unit volume) [Ashcroft & Mermin 10] of the "ions", and N A is the Avogadro constant.