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  2. Cathodic arc deposition - Wikipedia

    en.wikipedia.org/wiki/Cathodic_arc_deposition

    Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.

  3. Ion beam deposition - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_deposition

    Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]

  4. Category:Physical vapor deposition techniques - Wikipedia

    en.wikipedia.org/wiki/Category:Physical_vapor...

    Category for techniques in physical vapor deposition Pages in category "Physical vapor deposition techniques" The following 10 pages are in this category, out of 10 total.

  5. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  6. Category:Thin film deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Thin_film_deposition

    Download as PDF; Printable version; ... Pages in category "Thin film deposition" ... Cathodic arc deposition; Chemical bath deposition;

  7. Vacuum arc - Wikipedia

    en.wikipedia.org/wiki/Vacuum_arc

    The thermionic vacuum arc (TVA) is a new type of plasma source, which generates a plasma containing ions with a directed energy. TVA discharges can be ignited in high-vacuum conditions between a heated cathode (electron gun) and an anode (tungsten crucible) containing the material.

  8. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).

  9. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    Cathodic arc deposition (arc-physical vapor deposition), which is a kind of ion beam deposition where an electrical arc is created that blasts ions from the cathode. The arc has an extremely high power density resulting in a high level of ionization (30–100%), multiply charged ions, neutral particles, clusters and macro-particles (droplets).