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For power semiconductor devices (such as BJT, MOSFET, thyristor or IGBT), the safe operating area (SOA) is defined as the voltage and current conditions over which the device can be expected to operate without self-damage. [1] Illustration of safe operating area of a bipolar power transistor.
For several years, the Semiconductor Industry Association (SIA) gave this responsibility of coordination to the United States, which led to the creation of an American style roadmap, the National Technology Roadmap for Semiconductors (NTRS). [5] The first semiconductor roadmap, published by the SIA in 1993.
Listed are many semiconductor scale examples for various metal–oxide–semiconductor field-effect transistor (MOSFET, or MOS transistor) semiconductor manufacturing process nodes. Timeline of MOSFET demonstrations
The need for such programs was recognized relatively early in the history of ICs, and programs to perform this comparison were written as early as 1975. [1] These early programs operated mainly on the level of graph isomorphism, checking whether the schematic and layout were indeed identical. With the advent of digital logic, this was too ...
High-temperature operating life (HTOL) is a reliability test applied to integrated circuits (ICs) to determine their intrinsic reliability. This test stresses the IC at an elevated temperature, high voltage and dynamic operation for a predefined period of time.
Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.
Examples of the latter are a seal ring and filler structures. [13] Producing a reticle layout with test patterns and alignment marks. Layout-to-mask preparation that enhances layout data with graphics operations, such as resolution enhancement techniques (RET) – methods for increasing the quality of the final photomask.
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