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Neuropixels probes (or "Neuropixels") are electrodes developed in 2017 to record the activity of hundreds of neurons in the brain. The probes are based on CMOS technology and have 1,000 recording sites arranged in two rows on a thin, 1-cm long shank.
This not only increases the space between electrode probes, but also insulates the electrodes and increases impedance measurements. Problems with chronic implantation of arrays have been a driving force in the research of these devices. One novel study examined the neurodegenerative effects of inflammation caused by chronic implantation. [28]
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All three components are surgically implanted inside the body. Lead implantation may take place under local anesthesia or under general anesthesia ("asleep DBS"), such as for dystonia. A hole about 14 mm in diameter is drilled in the skull and the probe electrode is inserted stereotactically, using either frame-based or frameless stereotaxis. [14]
(Brain–computer interface research also includes technology such as EEG arrays that allow interface between mind and machine but do not require direct implantation of a device.) Neural implants such as deep brain stimulation and vagus nerve stimulation are increasingly becoming routine for patients with Parkinson's disease and clinical ...
Ion implantation setup with mass separator. Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy or using radiofrequency, and a target chamber, where the ions impinge on a target, which is the material to be implanted.
State attorneys general have launched a nationwide investigation into TikTok and its possible harmful effects on young users’ mental health, widening government scrutiny of the wildly popular ...
PIII-process with ECR-plasma source and magnetron. Plasma-immersion ion implantation (PIII) [1] or pulsed-plasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from the plasma by applying a high voltage pulsed DC or pure DC power supply and targeting them into a suitable substrate or electrode with a semiconductor wafer placed over it, so as to ...