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Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H 2 SO 4) and hydrogen peroxide (H 2 O 2). The resulting mixture is used to clean organic residues off substrates , for example silicon wafers . [ 1 ]
The optional second step (for bare silicon wafers) is a short immersion in a 1:100 or 1:50 solution of aqueous HF (hydrofluoric acid) at 25 °C for about fifteen seconds, in order to remove the thin oxide layer and some fraction of ionic contaminants. If this step is performed without ultra high purity materials and ultra clean containers, it ...
Piranha solution in particular constitutes quite a harsh treatment that can potentially damage the integrity of the silicon surface. Finlayson-Pitts et al. investigated the effect of certain treatments on silicon and concluded that both the roughness (3-5 Å) and the presence of scattered large particles were preserved after 1 cycle of plasma ...
Green death is a solution used to test the resistance of metals and alloys to corrosion. It consists of a mixture of sulfuric acid, hydrochloric acid, iron(III) chloride and copper(II) chloride and its boiling point is at approximately 103 °C. Its typical chemical composition is given in the table hereafter: [1] [2] [3] [4]
In single-crystal materials (e.g. silicon wafers), this effect can allow very high anisotropy, as shown in the figure. The term "crystallographic etching" is synonymous with "anisotropic etching along crystal planes". However, for some non-crystal materials like glass, there are unconventional ways to etch in an anisotropic manner. [2]
In chemistry, solvent effects are the influence of a solvent on chemical reactivity or molecular associations. Solvents can have an effect on solubility , stability and reaction rates and choosing the appropriate solvent allows for thermodynamic and kinetic control over a chemical reaction.
RCA-1 clean in ammonia-peroxide solution removes organic contamination and particles; RCA-2 cleaning in hydrogen chloride-peroxide mixture removes metallic impurities. Sulfuric acid-peroxide mixture (a.k.a. Piranha) removes organics. Hydrogen fluoride removes native oxide from silicon surface. These are all wet cleaning steps in solutions.
Using piranha solution to clean fritted glassware is a huge safety no-no and this article should not be proposing it as reasonable practice in any lab environment. 198.179.125.170 17:46, 14 November 2018 (UTC) Is the problem with piranha and frits, or with piranha and frits which still have organic solvents on them? Certainly the second has a ...