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  2. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry.

  3. Visual masking - Wikipedia

    en.wikipedia.org/wiki/Visual_masking

    Visual masking involves surrounding a target image (here, the word "radio") with another image. Visual masking is a phenomenon of visual perception. It occurs when the visibility of one image, called a target, is reduced by the presence of another image, called a mask. [1] The target might be invisible or appear to have reduced contrast or ...

  4. Kernel (image processing) - Wikipedia

    en.wikipedia.org/wiki/Kernel_(image_processing)

    In image processing, a kernel, convolution matrix, or mask is a small matrix used for blurring, sharpening, embossing, edge detection, and more. This is accomplished by doing a convolution between the kernel and an image .

  5. Alpha compositing - Wikipedia

    en.wikipedia.org/wiki/Alpha_compositing

    A color spectrum image with an alpha channel that falls off to zero at its base, where it is blended with the background color.. In computer graphics, alpha compositing or alpha blending is the process of combining one image with a background to create the appearance of partial or full transparency. [1]

  6. Template matching - Wikipedia

    en.wikipedia.org/wiki/Template_matching

    Template matching [1] is a technique in digital image processing for finding small parts of an image which match a template image. It can be used for quality control in manufacturing, [ 2 ] navigation of mobile robots , [ 3 ] or edge detection in images.

  7. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    In both cases, the mask covers the entire wafer, and simultaneously patterns every die. Contact printing/lithography is liable to damage both the mask and the wafer, [38] and this was the primary reason it was abandoned for high volume production. Both contact and proximity lithography require the light intensity to be uniform across an entire ...

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