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The Czochralski method, also Czochralski technique or Czochralski process, is a method of crystal growth used to obtain single crystals of semiconductors (e.g. silicon, germanium and gallium arsenide), metals (e.g. palladium, platinum, silver, gold), salts and synthetic gemstones.
In the semiconductor industry synthetic boules can be made by a number of methods, such as the Bridgman technique [2] and the Czochralski process, which result in a cylindrical rod of material. In the Czochralski process a seed crystal is required to create a larger crystal, or ingot. This seed crystal is dipped into the pure molten silicon and ...
Monocrystalline silicon, often referred to as single-crystal silicon or simply mono-Si, is a critical material widely used in modern electronics and photovoltaics. As the foundation for silicon-based discrete components and integrated circuits , it plays a vital role in virtually all modern electronic equipment, from computers to smartphones.
In the semiconductor industry, the term wafer appeared in the 1950s to describe a thin round slice of semiconductor material, typically germanium or silicon. The round shape characteristic of these wafers comes from single-crystal ingots usually produced using the Czochralski method. Silicon wafers were first introduced in the 1940s. [2] [3]
A semiconductor is a material that is between the conductor and insulator in ability to conduct electrical current. [1] In many cases their conducting properties may be altered in useful ways by introducing impurities ("doping") into the crystal structure. When two differently doped regions exist in the same crystal, a semiconductor junction is ...
Crystalline silicon or (c-Si) is the crystalline forms of silicon, either polycrystalline silicon (poly-Si, consisting of small crystals), or monocrystalline silicon (mono-Si, a continuous crystal). Crystalline silicon is the dominant semiconducting material used in photovoltaic technology for the production of solar cells.
The workers in a semiconductor fabrication facility are required to wear cleanroom suits to protect the devices from contamination by humans. [139] To increase yield, FOUPs and semiconductor capital equipment may have a mini environment with ISO class 1 level of dust, and FOUPs can have an even cleaner micro environment.
Indeed, epitaxy is the only affordable method of high quality crystal growth for many semiconductor materials. In surface science , epitaxy is used to create and study monolayer and multilayer films of adsorbed organic molecules on single crystalline surfaces via scanning tunnelling microscopy .