Search results
Results from the WOW.Com Content Network
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
Cathodic arc deposition: a high-power electric arc discharged at the target (source) material blasts away some into highly ionized vapor to be deposited onto the workpiece. Electron-beam physical vapor deposition : the material to be deposited is heated to a high vapor pressure by electron bombardment in "high" vacuum and is transported by ...
Category for techniques in physical vapor deposition Pages in category "Physical vapor deposition techniques" The following 10 pages are in this category, out of 10 total.
The thermionic vacuum arc (TVA) is a new type of plasma source, which generates a plasma containing ions with a directed energy. TVA discharges can be ignited in high-vacuum conditions between a heated cathode (electron gun) and an anode (tungsten crucible) containing the material.
Cathodic arc deposition (arc-physical vapor deposition), which is a kind of ion beam deposition where an electrical arc is created that blasts ions from the cathode. The arc has an extremely high power density resulting in a high level of ionization (30–100%), multiply charged ions, neutral particles, clusters and macro-particles (droplets).
Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).
In contrast, DLC is typically produced by processes in which high energy precursive carbons (e.g. in plasmas, in filtered cathodic arc deposition, in sputter deposition and in ion beam deposition) are rapidly cooled or quenched on relatively cold surfaces. In those cases cubic and hexagonal lattices can be randomly intermixed, layer by atomic ...