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  2. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  3. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Aluminising vacuum chamber at Mont Mégantic Observatory used for re-coating telescope mirrors. [1] Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can ...

  4. Pyrolytic chromium carbide coating - Wikipedia

    en.wikipedia.org/wiki/Pyrolytic_chromium_carbide...

    Pyrolytic chromium carbide coating (PCC) is a technology for protection and reworking of rapidly wearing parts of manufacturing equipment working in extreme environmental conditions, using vacuum deposition technology. Coating mechanical parts can help with problems of corrosion, adhering, high-temperature and mechanical wear thus reducing ...

  5. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    Thin-film deposition is a process applied in the semiconductor industry to grow electronic materials, in the aerospace industry to form thermal and chemical barrier coatings to protect surfaces against corrosive environments, in optics to impart the desired reflective and transmissive properties to a substrate and elsewhere in industry to modify surfaces to have a variety of desired properties.

  6. Ion plating - Wikipedia

    en.wikipedia.org/wiki/Ion_plating

    Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions.

  7. Metallised film - Wikipedia

    en.wikipedia.org/wiki/Metallised_film

    Aluminium is the most common metal used for deposition, but other metals such as nickel and chromium are also used. The metal is heated and evaporated under vacuum. This condenses on the cold polymer film, which is unwound near the metal vapour source. This coating is much thinner than a metal foil could be made, in the range of 0.5 micrometres ...

  8. Cathodic arc deposition - Wikipedia

    en.wikipedia.org/wiki/Cathodic_arc_deposition

    Cathodic arc deposition is actively used to synthesize extremely hard films to protect the surface of cutting tools and extend their life significantly. A wide variety of thin hard-film, Superhard coatings and nanocomposite coatings can be synthesized by this technology including TiN, TiAlN, CrN, ZrN, AlCrTiN and TiAlSiN.

  9. Metallizing - Wikipedia

    en.wikipedia.org/wiki/Metallizing

    This process gives useful (about 1 to 6 kgf/cm or 10 to 60 N/cm or 5 to 35 lbf/in) adhesion force, but is much weaker than actual metal-to-metal adhesion strength. Vacuum metallizing involves heating the coating metal to its boiling point in a vacuum chamber, then letting condensation deposit the metal on the substrate's surface.

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