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Image and Scanner Interface Specification (ISIS) is an industry standard interface for image scanning technologies, developed by Pixel Translations in 1990 (which became EMC Corporation's Captiva Software and later acquired by OpenText). [1] ISIS is an open standard for scanner control and a complete image-processing framework.
A millimeter wave scanner is a whole-body imaging device used for detecting objects concealed underneath a person’s clothing using a form of electromagnetic radiation. Typical uses for this technology include detection of items for commercial loss prevention , smuggling , and screening for weapons at government buildings and airport security ...
An early radar detector Car radar detector (Japanese). A radar detector is an electronic device used by motorists to detect if their speed is being monitored by police or law enforcement using a radar gun.
The central concept of the system is a unique number, a PlusCode, assigned to each programme, and published in television listings in newspapers and magazines (such as TV Guide). To record a programme, the code number is taken from the newspaper and input into the video recorder, which would then record on the correct channel at the correct time.
Lisp was the first language where the structure of program code is represented faithfully and directly in a standard data structure—a quality much later dubbed "homoiconicity". Thus, Lisp functions can be manipulated, altered or even created within a Lisp program without lower-level manipulations.
Drafter at work Copying technical drawings in 1973. Technical drawing, drafting or drawing, is the act and discipline of composing drawings that visually communicate how something functions or is constructed.
The slit height is the same as the field height. The slit width S, in turn, is limited by the number of pulses to make the dose (n), divided by the frequency of the laser pulses (f), at the maximum scan speed V max by S=V max *n/f. [13] At a fixed frequency f and pulse number n, the slit width will be proportional to the maximum stage speed.
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.