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Electrophoretic deposition (EPD), is a term for a broad range of industrial processes which includes electrocoating, cathodic electrodeposition, anodic electrodeposition, and electrophoretic coating, or electrophoretic painting.
Electroplating, also known as electrochemical deposition or electrodeposition, is a process for producing a metal coating on a solid substrate through the reduction of cations of that metal by means of a direct electric current.
It can be used for electrochemical deposition of thin films or for determining suitable reduction potential range of the ions present in electrolyte for electrochemical deposition. [13] CV can also be used to determine the electron stoichiometry of a system, the diffusion coefficient of an analyte, and the formal reduction potential of an ...
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm/min at relatively low substrate temperatures, with very high material utilization efficiency. The ...
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
The electroless deposition and electroplating bath actively performs cathodic and anodic reactions at the surface of the substrate. [2] [3] The standard electrode potential of the metal and reducing agent are important as a driving force for electron exchange. [3] The standard potential is defined as the power of reduction of compounds.
[13] [14] The vast range of substrate and deposition temperatures allows of the epitaxial growth of various elements considered challenging by other thin film growth techniques. [ 15 ] [ 16 ] Cathodic arc deposition (arc-physical vapor deposition), which is a kind of ion beam deposition where an electrical arc is created that blasts ions from ...