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  2. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which ...

  3. Microfabrication - Wikipedia

    en.wikipedia.org/wiki/Microfabrication

    Microfabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades, microelectromechanical systems (MEMS ...

  4. Wafer fabrication - Wikipedia

    en.wikipedia.org/wiki/Wafer_fabrication

    Each etch step is detailed in the following image. Note: Gate, source and drain contacts are not normally in the same plane in real devices, and the diagram is not to scale. Wafer fabrication is a procedure composed of many repeated sequential processes to produce complete electrical or photonic circuits on semiconductor wafers in semiconductor ...

  5. Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device...

    Wet etching was widely used in the 1960s and 1970s, [144] [145] but it was replaced by dry etching/plasma etching starting at the 10 micron to 3 micron nodes. [146] [147] This is because wet etching makes undercuts (etching under mask layers or resist layers with patterns). [148] [149] [150] Dry etching has become the dominant etching technique ...

  6. Surface micromachining - Wikipedia

    en.wikipedia.org/wiki/Surface_micromachining

    Dry etching can combine chemical etching with physical etching or ion bombardment. Surface micro-machining involves as many layers as are needed with a different mask (producing a different pattern) on each layer. Modern integrated circuit fabrication uses this technique and can use as many as 100 layers. Micro-machining is a younger technology ...

  7. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    Photolithography is the most common method for the semiconductor fabrication of integrated circuits ("ICs" or "chips"), such as solid-state memories and microprocessors. It can create extremely small patterns, down to a few nanometers in size. It provides precise control of the shape and size of the objects it creates.

  8. Printed circuit board milling - Wikipedia

    en.wikipedia.org/wiki/Printed_circuit_board_milling

    Printed circuit board milling (also: isolation milling) is the milling process used for removing areas of copper from a sheet of printed circuit board (PCB) material to recreate the pads, signal traces and structures according to patterns from a digital circuit board plan known as a layout file. [1] Similar to the more common and well known ...

  9. Process flow diagram - Wikipedia

    en.wikipedia.org/wiki/Process_flow_diagram

    A process flow diagram (PFD) is a diagram commonly used in chemical and process engineering to indicate the general flow of plant processes and equipment. The PFD displays the relationship between major equipment of a plant facility and does not show minor details such as piping details and designations. Another commonly used term for a PFD is ...