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  2. Spin coating - Wikipedia

    en.wikipedia.org/wiki/Spin_coating

    Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.

  3. Chemistry of photolithography - Wikipedia

    en.wikipedia.org/wiki/Chemistry_of_photolithography

    There are four basic parameters that are involved in spin coating: solution viscosity, solid content (density), angular speed, and spin time. [13] A range of thicknesses can be achieved by spin coating. Most commonly the thicknesses range from 1-200 μm. The main properties that affect the thickness of the film are viscosity and spin speed.

  4. Sol–gel process - Wikipedia

    en.wikipedia.org/wiki/Sol–gel_process

    Thus, many ceramic materials, both glassy and crystalline, have found use in various forms from bulk solid-state components to high surface area forms such as thin films, coatings and fibers. [10] [33] Also, thin films have found their application in the electronic field [34] and can be used as sensitive components of a resistive gas sensors. [35]

  5. Thin film - Wikipedia

    en.wikipedia.org/wiki/Thin_film

    A thin film is a layer of materials ranging from fractions ... Dip coating is similar to spin coating in that a liquid precursor or sol-gel precursor is deposited on ...

  6. Nanoparticle deposition - Wikipedia

    en.wikipedia.org/wiki/Nanoparticle_deposition

    The spin and dip coating methods are simple methods for nanoparticle deposition. [4] They are useful tools especially in creating self-assembled layers and films where the packing density isn't critical. Accurate and vibration-free sample withdrawal speeds can be used to have control over the film thickness.

  7. Layer by layer - Wikipedia

    en.wikipedia.org/wiki/Layer_by_layer

    Layer-by-layer (LbL) deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of complementary materials with wash steps in between. This can be accomplished by using various techniques such as immersion, spin, spray, electromagnetism, or fluidics. [1]

  8. Sputter deposition - Wikipedia

    en.wikipedia.org/wiki/Sputter_deposition

    Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...

  9. Self-cleaning glass - Wikipedia

    en.wikipedia.org/wiki/Self-cleaning_glass

    The first self-cleaning glass was based on a thin film titania coating. [3] The film can be applied by spin coating of organo-titanate chelated precursor (for example titanium iso-tetrapropoxide chelated by acetylacetone), followed by heat treatment at elevated temperatures to burn the organic residues and to form the anatase phase.

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