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The majority of silicon photonic communications have so far been limited to telecom [31] and datacom applications, [32] [33] where the reach is of several kilometers or several meters respectively. Silicon photonics, however, is expected to play a significant role in computercom as well, where optical links have a reach in the centimeter to ...
They can be in the form of whispering-gallery resonators, or as integrated ring resonators. Typical materials from which they are made could be semiconductors like Silicon, Silicon dioxide, silicon nitride, crystalline fluorides (CaF 2, MgF 2, SrF 2) or lithium niobate. The material is chosen such that it is low-loss and transparent in the ...
Refraction at interface. Many materials have a well-characterized refractive index, but these indices often depend strongly upon the frequency of light, causing optical dispersion.
In 1993, Dr. Motamedi officially introduced MOEMS for the first time, as the powerful combination of MEMS and micro-optics, in an invited talk at the SPIE Critical Reviews of Optical Science and Technology conference in San Diego. In this talk Dr. Motamedi introduced the figure below, for showing that MOEMS is the interaction of three major ...
The light travelling through the waveguides in an optical ring resonator remains within the waveguides due to the ray optics phenomenon known as total internal reflection (TIR). TIR is an optical phenomenon that occurs when a ray of light strikes the boundary of a medium and fails to refract through the boundary.
High-reflection (HR) coatings work the opposite way to antireflection coatings. The general idea is usually based on the periodic layer system composed from two materials, one with a high index, such as zinc sulfide (n=2.32) or titanium dioxide (n=2.4), and one with a low index, such as magnesium fluoride (n=1.38) or silicon dioxide (n=1.49).
Thickness of the Ge 40 Se 60 /Si film on the silicon substrate as 34.5 nm, Thickness of the Ge 40 Se 60 /Si film on the oxidized silicon substrate as 33.6 nm, Thickness of SiO 2 (with n and k spectra of SiO 2 held fixed), and; n and k spectra, in 190–1000 nm range, of Ge 40 Se 60 /Si.
Silicon oxynitride is a ceramic material with the chemical formula SiO x N y.While in amorphous forms its composition can continuously vary between SiO 2 and Si 3 N 4 (silicon nitride), the only known intermediate crystalline phase is Si 2 N 2 O. [2] It is found in nature as the rare mineral sinoite in some meteorites and can be synthesized in the laboratory.
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