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  2. Gallium arsenide - Wikipedia

    en.wikipedia.org/wiki/Gallium_arsenide

    Gallium arsenide was first synthesized and studied by Victor Goldschmidt and his co-partner Donder Vwishuna in 1926 by passing arsenic vapors mixed with hydrogen over gallium(III) oxide at 600 °C. [ 7 ] [ 8 ] The semiconductor properties of GaAs and other III-V compounds were patented by Heinrich Welker at Siemens-Schuckert in 1951 [ 9 ] and ...

  3. List of semiconductor materials - Wikipedia

    en.wikipedia.org/wiki/List_of_semiconductor...

    A compound semiconductor is a semiconductor compound composed of chemical elements of at least two different species. These semiconductors form for example in periodic table groups 13–15 (old groups III–V), for example of elements from the Boron group (old group III, boron, aluminium, gallium, indium) and from group 15 (old group V, nitrogen, phosphorus, arsenic, antimony, bismuth).

  4. Semiconductor device - Wikipedia

    en.wikipedia.org/wiki/Semiconductor_device

    Gallium arsenide (GaAs) is also widely used in high-speed devices but so far, it has been difficult to form large-diameter boules of this material, limiting the wafer diameter to sizes significantly smaller than silicon wafers thus making mass production of GaAs devices significantly more expensive than silicon. Gallium Nitride (GaN) is gaining ...

  5. Wide-bandgap semiconductor - Wikipedia

    en.wikipedia.org/wiki/Wide-bandgap_semiconductor

    Wide-bandgap semiconductors permit devices to operate at much higher voltages, frequencies, and temperatures than conventional semiconductor materials like silicon and gallium arsenide. They are the key component used to make short-wavelength (green-UV) LEDs or lasers , and are also used in certain radio frequency applications, notably military ...

  6. High-electron-mobility transistor - Wikipedia

    en.wikipedia.org/wiki/High-electron-mobility...

    The invention of the high-electron-mobility transistor (HEMT) is usually attributed to physicist Takashi Mimura (三村 高志), while working at Fujitsu in Japan. [4] The basis for the HEMT was the GaAs (gallium arsenide) MOSFET (metal–oxide–semiconductor field-effect transistor), which Mimura had been researching as an alternative to the standard silicon (Si) MOSFET since 1977.

  7. Thin-film solar cell - Wikipedia

    en.wikipedia.org/wiki/Thin-film_solar_cell

    Thin-film solar cells, a second generation of photovoltaic (PV) solar cells: Top: thin-film silicon laminates being installed onto a roof. Middle: CIGS solar cell on a flexible plastic backing and rigid CdTe panels mounted on a supporting structure Bottom: thin-film laminates on rooftops Thin-film solar cells are a type of solar cell made by depositing one or more thin layers (thin films or ...

  8. Gallium - Wikipedia

    en.wikipedia.org/wiki/Gallium

    At higher temperatures, however, it reacts with atmospheric oxygen to form gallium(III) oxide, Ga 2 O 3. [34] Reducing Ga 2 O 3 with elemental gallium in vacuum at 500 °C to 700 °C yields the dark brown gallium(I) oxide, Ga 2 O. [33]: 285 Ga 2 O is a very strong reducing agent, capable of reducing H 2 SO 4 to H 2 S.

  9. Bridgman–Stockbarger method - Wikipedia

    en.wikipedia.org/wiki/Bridgman–Stockbarger_method

    The Bridgman method is a popular way of producing certain semiconductor crystals such as gallium arsenide, for which the Czochralski method is more difficult. The process can reliably produce single-crystal ingots, but does not necessarily result in uniform properties through the crystal. [1]