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PVD coatings have the ability to utilize virtually any type of inorganic and some organic coating materials on an equally diverse group of substrates and surfaces using a wide variety of finishes. PVD processes are often more environmentally friendly than traditional coating processes such as electroplating and painting. [7] More than one ...
Hard chrome plating. Hard chrome, also known as industrial chrome or engineered chrome, is used to reduce friction, improve durability through abrasion tolerance and wear resistance in general, minimize galling or seizing of parts, expand chemical inertness to include a broader set of conditions (such as oxidation resistance), and bulking ...
Titanium nitride (TiN; sometimes known as tinite) is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.
This is a semi-bright finish that will still have some polishing lines but they will be very dull. Carbon steel and iron are commonly polished to a #7 finish before chrome plating. A #7 finish can be made bright by color buffing with coloring compound and a cotton buff.
Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...
When the vapor source is a liquid or solid, the process is called physical vapor deposition (PVD), [3] which is used in semiconductor devices, thin-film solar panels, and glass coatings. [4] When the source is a chemical vapor precursor, the process is called chemical vapor deposition (CVD).
The FDIC is an independent government agency charged with maintaining stability and public confidence in the U.S. financial system and providing insurance on consumer deposit accounts.
Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions .
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