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Download the file enwiki-YYYYMMDD-pages-articles.xml.bz2 from the most recent dump. For example, on your.org , go to directory YYYYMMDD for the most recent date (for example 20171020 ), and retrieve the requested file (for example enwiki- 20171020 -pages-articles.xml.bz2 ).
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.