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  2. Dimethyldichlorosilane - Wikipedia

    en.wikipedia.org/wiki/Dimethyldichlorosilane

    Dimethyldichlorosilane is a tetrahedral organosilicon compound with the formula Si(CH 3) 2 Cl 2. At room temperature it is a colorless liquid that readily reacts with water to form both linear and cyclic Si-O chains. Dimethyldichlorosilane is made on an industrial scale as the principal precursor to dimethylsilicone and polysilane compounds.

  3. Methyltrichlorosilane - Wikipedia

    en.wikipedia.org/wiki/Methyltrichlorosilane

    2 CH 3 Cl + Si → (CH 3) 4−n SiCl n + other products While this reaction is the standard in industrial silicone production and is nearly identical to the first direct synthesis of methyltrichlorosilane, the overall process is inefficient with respect to methyltrichlorosilane. [ 2 ]

  4. Silicon tetrachloride - Wikipedia

    en.wikipedia.org/wiki/Silicon_tetrachloride

    Vapor phase epitaxy of reducing silicon tetrachloride with hydrogen at approximately 1250 °C was done: SiCl 4 (g) + 2 H 2 (g) → Si(s) + 4 HCl (g) at 1250°C [11] The produced polysilicon is used as wafers in large amounts by the photovoltaic industry for conventional solar cells made of crystalline silicon and also by the semiconductor industry.

  5. Methyltrimethoxysilane - Wikipedia

    en.wikipedia.org/wiki/Methyltrimethoxysilane

    C 4 H 12 O 3 Si: Molar mass: 136.222 g·mol −1 Appearance Colorless liquid Density: 0.955 g/cm 3: Boiling point: 102–104 °C (216–219 °F; 375–377 K)

  6. Trimethylsilane - Wikipedia

    en.wikipedia.org/wiki/Trimethylsilane

    The Si-H bond is reactive. Being a gas, it is less commonly used as a reagent than the related triethylsilane , which is a liquid at room temperature. Trimethylsilane is used in the semiconductor industry as precursor to deposit dielectrics and barrier layers via plasma-enhanced chemical vapor deposition (PE-CVD). [ 1 ]

  7. Trimethylsilanol - Wikipedia

    en.wikipedia.org/wiki/Trimethylsilanol

    The vapor pressure function according to Antoine is obtained as log 10 (P/1 bar) = A − B/(T + C) (P in bar, T in K) with A = 5.44591, B = 1767.766 K and C = −44.888 K in a temperature range from 291 K to 358 K. [2] Below the melting point at −4.5 °C, [12] The 1 H NMR in CDCl 3 shows a singlet at δ=0.14 ppm.

  8. Hexachlorodisilane - Wikipedia

    en.wikipedia.org/wiki/Hexachlorodisilane

    The molecule adopts a structure like ethane, with a single Si-Si bond length of 233 pm. [2] Hexachlorodisilane is produced in the chlorination of silicides such as e.g. calcium silicide. Idealized syntheses are as follows: [3] CaSi 2 + 4 Cl 2 → Si 2 Cl 6 + CaCl 2

  9. 1,2-Dichloroethylene - Wikipedia

    en.wikipedia.org/wiki/1,2-dichloroethylene

    C 2 H 2 + Cl 2 → C 2 H 2 Cl 2. Industrially both isomers arise as byproducts of the production of vinyl chloride, which is produced on a vast scale. Unlike 1,1-dichloroethylene, the 1,2-dichloroethylene isomers do not polymerize. [1] trans-1,2-DCE has applications including electronics cleaning, precision cleaning, and certain metal cleaning ...