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  2. Pulsed laser deposition - Wikipedia

    en.wikipedia.org/wiki/Pulsed_laser_deposition

    A plume ejected from a SrRuO 3 target during pulsed laser deposition. One possible configuration of a PLD deposition chamber. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.

  3. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Evaporative deposition: the material to be deposited is heated to a high vapor pressure by electrical resistance heating in "high" vacuum. [4] [5] Close-space sublimation, the material, and substrate are placed close to one another and radiatively heated. Pulsed laser deposition: a high-power laser ablates material from the target into a vapor.

  4. Pulsed laser - Wikipedia

    en.wikipedia.org/wiki/Pulsed_laser

    Pulsed operation of lasers refers to any laser not classified as continuous wave, so that the optical power appears in pulses of some duration at some repetition rate. [1] This encompasses a wide range of technologies addressing a number of different motivations. Some lasers are pulsed simply because they cannot be run in continuous mode.

  5. Laser ablation - Wikipedia

    en.wikipedia.org/wiki/Laser_ablation

    A variation of this type of application is to use laser ablation to create coatings by ablating the coating material from a source and letting it deposit on the surface to be coated; this is a special type of physical vapor deposition called pulsed laser deposition (PLD), [8] and can create coatings from materials that cannot readily be ...

  6. Thermal laser epitaxy - Wikipedia

    en.wikipedia.org/wiki/Thermal_Laser_Epitaxy

    Thermal laser epitaxy (TLE) is a physical vapor deposition technique that utilizes irradiation from continuous-wave lasers to heat sources locally for growing films on a substrate. [ 1 ] [ 2 ] This technique can be performed under ultra-high vacuum pressure or in the presence of a background atmosphere, such as ozone , to deposit oxide films.

  7. Vapor–liquid–solid method - Wikipedia

    en.wikipedia.org/wiki/Vapor–liquid–solid_method

    The high intensity of the laser pulse incident at the target allows the deposition of high melting point materials, without having to try to evaporate the material using extremely high temperature resistive or electron bombardment heating. Furthermore, targets can simply be made from a mixture of materials or even a liquid.

  8. Localized pulsed electrodeposition - Wikipedia

    en.wikipedia.org/wiki/Localized_pulsed_electro...

    Localized pulsed electrodeposition (L-PED) is a technique for direct 3D printing of free-standing and layer-by-layer micro/nano-scale metallic structures at the tip of an electrolyte containing nozzle. [1]

  9. Laboratory for Laser Energetics - Wikipedia

    en.wikipedia.org/wiki/Laboratory_for_Laser...

    The Laboratory for Laser Energetics (LLE) is a scientific research facility which is part of the University of Rochester's south campus, located in Brighton, New York. The lab was established in 1970 with operations jointly funded by the United States Department of Energy , the University of Rochester and the New York State government.