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A plume ejected from a SrRuO 3 target during pulsed laser deposition. One possible configuration of a PLD deposition chamber. Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.
Pulsed operation of lasers refers to any laser not classified as continuous wave, so that the optical power appears in pulses of some duration at some repetition rate. [1] This encompasses a wide range of technologies addressing a number of different motivations. Some lasers are pulsed simply because they cannot be run in continuous mode.
Evaporative deposition: the material to be deposited is heated to a high vapor pressure by electrical resistance heating in "high" vacuum. [4] [5] Close-space sublimation, the material, and substrate are placed close to one another and radiatively heated. Pulsed laser deposition: a high-power laser ablates material from the target into a vapor.
A variation of this type of application is to use laser ablation to create coatings by ablating the coating material from a source and letting it deposit on the surface to be coated; this is a special type of physical vapor deposition called pulsed laser deposition (PLD), [8] and can create coatings from materials that cannot readily be ...
Thermal laser epitaxy (TLE) is a physical vapor deposition technique that utilizes irradiation from continuous-wave lasers to heat sources locally for growing films on a substrate. [ 1 ] [ 2 ] This technique can be performed under ultra-high vacuum pressure or in the presence of a background atmosphere, such as ozone , to deposit oxide films.
The high intensity of the laser pulse incident at the target allows the deposition of high melting point materials, without having to try to evaporate the material using extremely high temperature resistive or electron bombardment heating. Furthermore, targets can simply be made from a mixture of materials or even a liquid.
The current impediment to large-scale IGZO manufacturing is the synthesis method. The most widely used technique for transparent conducting oxide (TCO) synthesis is pulsed laser deposition (PLD). [12] In PLD, a laser is used to focus on nano-sized spots on solid elemental targets. Laser pulse frequencies are varied between the targets in ratios ...
Superconducting layer in the 2nd generation superconducting wires can also be grown by pulsed laser deposition (PLD). Christen provides an overview of the PLD process used to deposit high-quality YBCO films. [35]
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