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  2. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    As the diagram on the right shows, the gallium (Ga+) primary ion beam hits the sample surface and sputters a small amount of material, which leaves the surface as either secondary ions (i+ or i−) or neutral atoms (n 0). The primary beam also produces secondary electrons (e −). As the primary beam rasters on the sample surface, the signal ...

  3. Gas focusing - Wikipedia

    en.wikipedia.org/wiki/Gas_focusing

    Gas focusing, also known as ionic focusing.. Rather than being dispersed, a beam of charged particles travelling in an inert gas environment sometimes becomes narrower. This is ascribed to the generation of gas ions which diffuse outwards, neutralizing the particle beam globally, and producing an intense radial electric field which applies a radially inward force to the particles in the beam.

  4. Ion beam deposition - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_deposition

    Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]

  5. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.

  6. List of vacuum tubes - Wikipedia

    en.wikipedia.org/wiki/List_of_vacuum_tubes

    G – Glass bulb, ST-12 to ST-16 ... QQ-004/11 – Dual beam power tetrode up ... It comes in the variation as the 3AW2A as a replacement for the 3AW2 after the 1967 ...

  7. Ion beam lithography - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_lithography

    Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.

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