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The 65 nm process is an advanced lithographic node used in volume CMOS semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm.
The technology used a 32 nm SOI process, two CPU cores per module, and up to four modules, ranging from a quad-core design costing approximately US$130 to a $280 eight-core design. Ambarella Inc. announced the availability of the A7L system-on-a-chip circuit for digital still cameras, providing 1080p60 high-definition video capabilities in ...
65 nm arm926ej-s @ 192 mhz hsdpa, 1xev-do q1 2007 qsc6065 hsdpa, 1xev-do q2 2007 qsc6075 [6] 1xev-do rev.0 qsc6085 1xev-do rev.a q4 2007 qsc6155 [7] arm1136jf-s @ 480 mhz adsp @ 160 mhz cdma 2000, gsm, gprs, edge, ev-do rel.0, bt 3.0 2008 qsc6175 qsc6185 qsc6240 arm926ej-s @ 184 mhz no 3d, arm 2d hsdpa: q3 2007 qsc6245-1 qsc6260-1 gsm, gprs ...
In CPU fabrications, a die shrink always involves an advance to a lithographic node as defined by ITRS (see list). For GPU and SoC manufacturing, the die shrink often involves shrinking the die on a node not defined by the ITRS, for instance, the 150 nm, 110 nm, 80 nm, 55 nm, 40 nm and more currently 8 nm nodes, sometimes referred to as "half-nodes".
reengineered P6-based microarchitecture used in Intel Core 2 and Xeon microprocessors, built on a 65 nm process, supporting x86-64 level SSE instruction and macro-op fusion and enhanced micro-op fusion with a wider front end and decoder, larger out-of-order core and renamed register, support loop stream detector and large shadow register file.
Turion 64 X2 dual-core 64-bit Hawk family processor 65 nm (codenamed Tyler), or; Mobile Sempron single-core 64-bit processor 65 nm (codenamed Sherman) Mobile chipset HDMI, HyperTransport 1.0 and PCI Express 1.0; DDR2-800 SO-DIMM; Mobile support Wireless IEEE 802.11 a/b/g/draft-N support, mini-PCIe Wi-Fi adapter; Hybrid hard drives
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The new six-input LUT represented a tradeoff between better handling of increasingly complex combinational functions, at the expense of a reduction in the absolute number of LUTs per device. The Virtex-5 series is a 65 nm design fabricated in 1.0 V, triple-oxide process technology. [22] [23]