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  2. Ion milling machine - Wikipedia

    en.wikipedia.org/wiki/Ion_milling_machine

    Ion sources are fundamental to ion milling. Their design and operation are crucial to producing accurate results. The most commonly used ion source relies on radiofrequency (RF) ion sources and direct current (DC) electric fields to generate and accelerate ions from a gas, typically a noble gas like argon or xenon.

  3. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold and iridium are also available. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle, and heated gallium wets the tungsten and flows to the tip of the needle, where the opposing forces of surface tension and electric field form the ...

  4. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.

  5. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Ion milling, or sputter etching, uses lower pressures, often as low as 10 −4 Torr (10 mPa). It bombards the wafer with energetic ions of noble gases, often Ar +, which knock atoms from the substrate by transferring momentum. Because the etching is performed by ions, which approach the wafer approximately from one direction, this process is ...

  6. Cross section (electronics) - Wikipedia

    en.wikipedia.org/wiki/Cross_section_(electronics)

    In electronics, a cross section, cross-section, or microsection, is a prepared electronics sample that allows analysis at a plane that cuts through the sample.It is a destructive technique requiring that a portion of the sample be cut or ground away to expose the internal plane for analysis.

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  8. Ion implantation - Wikipedia

    en.wikipedia.org/wiki/Ion_implantation

    Ion implantation setup with mass separator. Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy or using radiofrequency, and a target chamber, where the ions impinge on a target, which is the material to be implanted.

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