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Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
The electron beam is focused by a thick magnetic lens. In a sharp crossover, the electron current density can reach values, which significantly exceed that for the Brillouin focusing of laminar flow of electrons. [5] The extraction of ions from the ion source can be realized in both axial and radial directions.
Most focused ion beam instruments use a liquid-metal ion sources (LMIS) often with gallium. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle and heated gallium wets the tungsten and flows to the tip of the needle where the opposing forces of surface tension and electric field produce the cusp shaped Taylor cone.
The configuration of the ion beam apparatus can be changed and made more complex with the incorporation of additional components. The techniques for ion beam analysis are designed for specific purposes. Some techniques and ion sources are shown in table 1. Detector types and arrangements for ion beam techniques are shown in table 2.
The Electron beam ion trap (EBIT), based on the same principle, can produce up to bare uranium ions and can be used as an ion source as well. Heavy ions can also be generated with an ion gun which typically uses the thermionic emission of electrons to ionize a substance in its gaseous state.
A piece of oxidized tantalum that has been sputtered using an ion gun. An Ion Gun typically refers to an instrument that generates a beam of heavy ions with a well defined energy distribution. The ion beam is produced from a plasma that has been confined within a volume. Ions of a particular energy are extracted, accelerated, collimated and/or ...
Ion-beam lithography offers higher resolution patterning than UV, X-ray, or electron beam lithography because these heavier particles have more momentum. This gives the ion beam a smaller wavelength than even an e-beam and therefore almost no diffraction. The momentum also reduces scattering in the target and in any residual gas.